We report on a photosensitive hybrid material based on 3-glycidoxypropyltrimethoxysilane (GPTMS) and on the cationic photopolymerization of the epoxide groups. In particular, we describe the synthesis and fabrication of patterned waveguide structures by ultraviolet (UV) irradiation through a quartz slide with a metallic mask. An increase of 0.01 of the material refractive index has been measured when the film is exposed to U-V light in the range of 220-260 nm. The surface morphology and the optical properties of the structures are reported. (C) 2006 Elsevier B.V All rights reserved.
Brusatin, G., Della Giustina, G., Guglielmi, M., Casalboni, M., Prosposito, P., Schutzmann, S., et al. (2007). Direct pattern of photocurable glycidoxypropyltrimethoxysilane based sol-gel hybrid waveguides for photonic applications. In Materials Science and Engineering C (pp.1022-1025). AMSTERDAM : ELSEVIER SCIENCE BV [10.1016/j.msec.2006.06.020].
Direct pattern of photocurable glycidoxypropyltrimethoxysilane based sol-gel hybrid waveguides for photonic applications
CASALBONI, MAURO;PROSPOSITO, PAOLO;
2007-01-01
Abstract
We report on a photosensitive hybrid material based on 3-glycidoxypropyltrimethoxysilane (GPTMS) and on the cationic photopolymerization of the epoxide groups. In particular, we describe the synthesis and fabrication of patterned waveguide structures by ultraviolet (UV) irradiation through a quartz slide with a metallic mask. An increase of 0.01 of the material refractive index has been measured when the film is exposed to U-V light in the range of 220-260 nm. The surface morphology and the optical properties of the structures are reported. (C) 2006 Elsevier B.V All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
