Herein, we present the results obtained with a field effect transistor fabricated using a thin gallium selenide (GaSe) flake as the channel. The fabricated device exhibits n-type conduction behaviour and shows a photo response under illumination by a laser. Notably, the device exhibits memory behaviour maintaining stability for more than 4 hours with repeatable cycles and sensitivity to light stimuli. This confirms its potential as a non-volatile optoelectronic memory, offering an enhanced programming window under laser illumination. The results provide a fundamental understanding of n-type conduction of GaSe thin flake and demonstrate that the investigated material could be suitable for future opto electronic devices.
Kumar, A., Pelella, A., Intonti, K., Viscardi, L., Durante, O., Giubileo, F., et al. (2025). n-type GaSe thin flake for optoelectronic devices. In Il Nuovo Cimento C. VIA SARAGOZZA, 12, I-40123 BOLOGNA, ITALY : Società Italiana di Fisica [10.1393/ncc/i2025-25206-y].
n-type GaSe thin flake for optoelectronic devices
Durante O.;Camilli L.;
2025-01-01
Abstract
Herein, we present the results obtained with a field effect transistor fabricated using a thin gallium selenide (GaSe) flake as the channel. The fabricated device exhibits n-type conduction behaviour and shows a photo response under illumination by a laser. Notably, the device exhibits memory behaviour maintaining stability for more than 4 hours with repeatable cycles and sensitivity to light stimuli. This confirms its potential as a non-volatile optoelectronic memory, offering an enhanced programming window under laser illumination. The results provide a fundamental understanding of n-type conduction of GaSe thin flake and demonstrate that the investigated material could be suitable for future opto electronic devices.| File | Dimensione | Formato | |
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