We have realized a 3D substrate for surface-enhanced Raman scattering (SERS) sensor with DELIL (Double Exposure Laser Interference Lithography) technique and silver nanoparticles (Ag-NPs) functionalized with an appropriate aptamer. The 3D substrates were obtained by means of soft mold technique in thin layer of sol-gel Ti/TMSPM on silicon substrate using intermediate stamp fabricated in a photosensitive material. The stamp was in turn produced with a Lloyd's mirror set up by means of double exposition (Ar+ laser at 364nm, 23mW) of a photopolymerizable thin film at two mutually orthogonal orientation.The obtained 3D gratings have regular cross-weave texture with holes and pillars. The Ag-NPs were deposited by drop-casting on the 3D substrates and they arranged themselves inside the holes. This controlled Ag-NPs distribution allows the system to be a potential candidate for a good SERS sensor. The easy replication of the 3D substrates from a single stamp makes this technique attractive for applications in analytic and environmental fields.

Ciotta, E., Dao, T.h., Casalboni, M., Prosposito, P., Francini, R., Casciardi, S., et al. (2021). Substrate for SERS sensor realized by DELIL (Double Exposure Laser Interference Lithography) technique. In Nanoinnovation 2020. New York : American Institute of Physics [10.1063/5.0070081].

Substrate for SERS sensor realized by DELIL (Double Exposure Laser Interference Lithography) technique

E. Ciotta;T. H. Dao;M. Casalboni;P. Prosposito;R. Francini;F. De Matteis
2021-01-01

Abstract

We have realized a 3D substrate for surface-enhanced Raman scattering (SERS) sensor with DELIL (Double Exposure Laser Interference Lithography) technique and silver nanoparticles (Ag-NPs) functionalized with an appropriate aptamer. The 3D substrates were obtained by means of soft mold technique in thin layer of sol-gel Ti/TMSPM on silicon substrate using intermediate stamp fabricated in a photosensitive material. The stamp was in turn produced with a Lloyd's mirror set up by means of double exposition (Ar+ laser at 364nm, 23mW) of a photopolymerizable thin film at two mutually orthogonal orientation.The obtained 3D gratings have regular cross-weave texture with holes and pillars. The Ag-NPs were deposited by drop-casting on the 3D substrates and they arranged themselves inside the holes. This controlled Ag-NPs distribution allows the system to be a potential candidate for a good SERS sensor. The easy replication of the 3D substrates from a single stamp makes this technique attractive for applications in analytic and environmental fields.
Nanoinnovation 2020
Roma
2020
Rilevanza internazionale
2021
Settore PHYS-03/A - Fisica sperimentale della materia e applicazioni
English
Intervento a convegno
Ciotta, E., Dao, T.h., Casalboni, M., Prosposito, P., Francini, R., Casciardi, S., et al. (2021). Substrate for SERS sensor realized by DELIL (Double Exposure Laser Interference Lithography) technique. In Nanoinnovation 2020. New York : American Institute of Physics [10.1063/5.0070081].
Ciotta, E; Dao, Th; Casalboni, M; Prosposito, P; Francini, R; Casciardi, S; De Matteis, F
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/393805
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