An accurate determination of the valence band discontinuity of the lattice matched GaAs/InGaP heterostructure is performed by admittance spectroscopy measurements in p+/MQW/n+ structures grown by metal-organic vapour phase epitaxy (MOVPE) using tertiarybutylarsine and tertiarybutylphosphine as alternative precursors for the V group elements. Through the analysis of the temperature dependence of the resonance frequency at which the isothermal curves of the conductance over frequency G(ω)/ω have the maximum, the energy separation of 336 ± 5 meV between the lowest heavy hole quantum level in the GaAs wells and the InGaP valence band top is obtained. A valence band discontinuity of EV = 346 ± 5 meV is then derived by accounting for the calculated confinement energy of heavy holes (Ehh 1 = 10 meV). Experimental values of EV previously reported in the literature spread over the wide range of 300–400 meV

Gombia, E., Ghezzi, C., Parisini, A., Tarricone, L., Longo, M. (2008). Admittance spectroscopy of GaAs/InGaP MQW structures. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 147(2-3), 171-174 [10.1016/j.mseb.2007.08.017].

Admittance spectroscopy of GaAs/InGaP MQW structures

Longo, M.
2008-01-01

Abstract

An accurate determination of the valence band discontinuity of the lattice matched GaAs/InGaP heterostructure is performed by admittance spectroscopy measurements in p+/MQW/n+ structures grown by metal-organic vapour phase epitaxy (MOVPE) using tertiarybutylarsine and tertiarybutylphosphine as alternative precursors for the V group elements. Through the analysis of the temperature dependence of the resonance frequency at which the isothermal curves of the conductance over frequency G(ω)/ω have the maximum, the energy separation of 336 ± 5 meV between the lowest heavy hole quantum level in the GaAs wells and the InGaP valence band top is obtained. A valence band discontinuity of EV = 346 ± 5 meV is then derived by accounting for the calculated confinement energy of heavy holes (Ehh 1 = 10 meV). Experimental values of EV previously reported in the literature spread over the wide range of 300–400 meV
2008
Pubblicato
Rilevanza internazionale
Articolo
Esperti anonimi
Settore FIS/03
English
Con Impact Factor ISI
Admittance measurements; III–V Semiconductors; Heterosructures; Quantum wells; Metal-organic chemical vapour deposition (MOCVD)
Gombia, E., Ghezzi, C., Parisini, A., Tarricone, L., Longo, M. (2008). Admittance spectroscopy of GaAs/InGaP MQW structures. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 147(2-3), 171-174 [10.1016/j.mseb.2007.08.017].
Gombia, E; Ghezzi, C; Parisini, A; Tarricone, L; Longo, M
Articolo su rivista
File in questo prodotto:
File Dimensione Formato  
Admittance spectroscopy of GaAs-InGaP MQW structures.pdf

solo utenti autorizzati

Tipologia: Versione Editoriale (PDF)
Licenza: Copyright dell'editore
Dimensione 235.69 kB
Formato Adobe PDF
235.69 kB Adobe PDF   Visualizza/Apri   Richiedi una copia

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/351089
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 3
  • ???jsp.display-item.citation.isi??? 3
social impact