The stoichiometry of Ge/Si islands grown on Si(111) substrates at temperatures ranging from 460 to 560 degreesC was investigated by x-ray photoemission electron microscopy (XPEEM). By developing a specific analytical framework, quantitative information on the surface Ge/Si stoichiometry was extracted from laterally resolved XPEEM Si 2p and Ge 3d spectra, exploiting the chemical sensitivity of the technique. Our data show the existence of a correlation between the base area of the self-assembled islands and their average surface Si content: the larger the lateral dimensions of the 3D structures, the higher their relative Si concentration. The deposition temperature determines the characteristics of this relation, pointing to the thermal activation of kinetic diffusion processes. (C) 2005 American Institute of Physics.

Ratto, F., Rosei, F., Locatelli, A., Cherifi, S., Fontana, S., Heun, S., et al. (2005). Composition of Ge(Si) islands in the growth of Ge on Si(111) by x-ray spectromicroscopy. JOURNAL OF APPLIED PHYSICS, 97(4), 043516 [10.1063/1.1832747].

Composition of Ge(Si) islands in the growth of Ge on Si(111) by x-ray spectromicroscopy

Sgarlata, Anna;De Crescenzi, Maurizio;Motta, Nunzio
2005-01-01

Abstract

The stoichiometry of Ge/Si islands grown on Si(111) substrates at temperatures ranging from 460 to 560 degreesC was investigated by x-ray photoemission electron microscopy (XPEEM). By developing a specific analytical framework, quantitative information on the surface Ge/Si stoichiometry was extracted from laterally resolved XPEEM Si 2p and Ge 3d spectra, exploiting the chemical sensitivity of the technique. Our data show the existence of a correlation between the base area of the self-assembled islands and their average surface Si content: the larger the lateral dimensions of the 3D structures, the higher their relative Si concentration. The deposition temperature determines the characteristics of this relation, pointing to the thermal activation of kinetic diffusion processes. (C) 2005 American Institute of Physics.
2005
Pubblicato
Rilevanza internazionale
Articolo
Esperti anonimi
Settore FIS/03 - FISICA DELLA MATERIA
English
Ratto, F., Rosei, F., Locatelli, A., Cherifi, S., Fontana, S., Heun, S., et al. (2005). Composition of Ge(Si) islands in the growth of Ge on Si(111) by x-ray spectromicroscopy. JOURNAL OF APPLIED PHYSICS, 97(4), 043516 [10.1063/1.1832747].
Ratto, F; Rosei, F; Locatelli, A; Cherifi, S; Fontana, S; Heun, S; Szkutnik, P; Sgarlata, A; De Crescenzi, M; Motta, N
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/207690
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