The design of the injection and bunching section for a Sub-millimetric klystron is described in this paper. A Carbon nanotube cold cathode is employed to produce the required beam current. An opportune shape of the device has been chosen to allow for the micro-fabrication, while ensuring the correct Buncher excitation. In this range of critical dimensions, multiple physics influencing factors, due to the heating effects and power dissipations over the beam dynamics, may alter the desired behavior of the device. A multiphysics design approach has been employed to ensure the future correct operation selecting appropriate materials and shapes. Several strategies have been adopted to obtain a simple but reliable model.
Alberto, L., Davide, P., DI PAOLO, F., Saggio, G., Benedetto, G. (2015). Injection/bunching section design of a Sub-millimetric klystron. In 2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO) (pp.514-517). Institute of Electrical and Electronics Engineers Inc. [10.1109/NANO.2015.7388652].
Injection/bunching section design of a Sub-millimetric klystron
DI PAOLO, FRANCO;SAGGIO, GIOVANNI;
2015-01-01
Abstract
The design of the injection and bunching section for a Sub-millimetric klystron is described in this paper. A Carbon nanotube cold cathode is employed to produce the required beam current. An opportune shape of the device has been chosen to allow for the micro-fabrication, while ensuring the correct Buncher excitation. In this range of critical dimensions, multiple physics influencing factors, due to the heating effects and power dissipations over the beam dynamics, may alter the desired behavior of the device. A multiphysics design approach has been employed to ensure the future correct operation selecting appropriate materials and shapes. Several strategies have been adopted to obtain a simple but reliable model.File | Dimensione | Formato | |
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