One-step growth and shaping by a dual plasma reactor of diamond nanocones arrays for the assembling of stable cold cathodes

Arrays of conical-shaped nanodiamond structures are formed on silicon substrate by a single-step CVD process from CH4/H2 mixtures. The formation of these nanocones has been found to depend on interplay between growing and etching during the CVD process carried out in a dual-mode MW/RF plasma reactor. Morphology and structure of the conical-like systems can be controlled by varying the process parameters, and have been investigated by scanning electron microscopy (SEM), reflection high energy electron diffraction (RHEED) and micro-Raman spectroscopy. The Field Emission (FE) properties of different diamond nanocones arrays have been investigated and compared with those of analogous systems in order to assess the feasibility of the present nanomaterials as electron emitters for cold cathodes. The FE behavior is discussed taking into account the structure of the different diamond nanocones.