The Pd/SiOx/a-Si:H hydrogen sensor has been investigated by photoemission spectroscopy with synchrotron radiation. We measured directly the valence-band discontinuity and the built-in potential during the first stage of formation of the interface obtained by depositing thin amorphous silicon overlayers on Pd/SiOx substrates. Changes of the interface parameters were measured after hydrogen exposure and subsequent hydrogen removal with oxygen. Hydrogen sensitivity is related to hydrogen induced Schottky barrier modulation.
Fortunato, G., D'Amico, A., Coluzza, C., Sette, F., Capasso, C., Patella, F., et al. (1984). Detection of hydrogen induced Schottky barrier modulation in Pd/SiO x/a-Si:H diodes by photoemission with synchrotron radiation. APPLIED PHYSICS LETTERS, 44(9), 887-889.
Tipologia: | Articolo su rivista |
Citazione: | Fortunato, G., D'Amico, A., Coluzza, C., Sette, F., Capasso, C., Patella, F., et al. (1984). Detection of hydrogen induced Schottky barrier modulation in Pd/SiO x/a-Si:H diodes by photoemission with synchrotron radiation. APPLIED PHYSICS LETTERS, 44(9), 887-889. |
IF: | Con Impact Factor ISI |
Lingua: | English |
Settore Scientifico Disciplinare: | Settore FIS/03 - Fisica della Materia |
Revisione (peer review): | Sì, ma tipo non specificato |
Tipo: | Articolo |
Rilevanza: | Rilevanza internazionale |
Digital Object Identifier (DOI): | http://dx.doi.org/10.1063/1.94967 |
Stato di pubblicazione: | Pubblicato |
Data di pubblicazione: | 1984 |
Titolo: | Detection of hydrogen induced Schottky barrier modulation in Pd/SiO x/a-Si:H diodes by photoemission with synchrotron radiation |
Autori: | |
Autori: | Fortunato, G; D'Amico, A; Coluzza, C; Sette, F; Capasso, C; Patella, F; Quaresima, C; Perfetti, P |
Appare nelle tipologie: | 01 - Articolo su rivista |