Fluorescence and Raman micro-spectroscopy of LiF films containing radiation-induced defects for X-ray detection

Lithium fluoride (LiF) film detectors for extreme ultraviolet radiation, soft and hard X-rays, based on the photoluminescence of radiation-induced electronic defects, have been proposed and are currently under further development and investigation. LiF film detectors are versatile and can be integrated in different experimental apparatus and imaging configurations. LiF can be grown in the form of polycrystalline thin films and it is compatible with several substrates. The radiation-induced color center (CCs) photoluminescence (PL) response can be enhanced through the appropriate choice of substrates and multilayer designs, and by tailoring the micro-structural properties of polycrystalline LiF films through the control of the growth conditions. In this work, we present the characterization, through fluorescence and Raman micro-spectroscopy, of LiF films, thermally evaporated on different substrates with thicknesses of up to 1 mu m, irradiated with soft X-rays produced by a laser plasma source. The combination of these micro-spectroscopy techniques could represent an advanced method to investigate the role of the polycrystalline film structures in CC formation efficiency at the microscopic level, a fundamental aspect of the development of LiF film radiation-imaging detectors.