For the first time the results of the chemical vapor infiltration (CVI) of nanostructured sp(2) carbon in mesoporous silicon layers under process conditions normally used to grow diamond films by Hot Filament Chemical Vapour Deposition (HFCVD) are presented. The combined use of micro-Raman spectroscopy and Field Emission Gun Scanning Electron Microscopy (FEG-SEM) clearly demonstrated that disordered graphitic carbon was infiltrated in the PS pores, thus permeating completely the PS layer. Such a nanostructured carbon infiltration provided new properties to the PS material, which are potentially of great relevance for opto-electronics and sensors applications.

Mattei, G., Valentini, V., & Polini, R. (2007). Chemical vapour infiltration of nano-structured carbon in porous silicon. PHYSICA STATUS SOLIDI. C, CURRENT TOPICS IN SOLID STATE PHYSICS, 4(6), 2049-2053 [10.1002/pssc.200674363].

Chemical vapour infiltration of nano-structured carbon in porous silicon

POLINI, RICCARDO
2007

Abstract

For the first time the results of the chemical vapor infiltration (CVI) of nanostructured sp(2) carbon in mesoporous silicon layers under process conditions normally used to grow diamond films by Hot Filament Chemical Vapour Deposition (HFCVD) are presented. The combined use of micro-Raman spectroscopy and Field Emission Gun Scanning Electron Microscopy (FEG-SEM) clearly demonstrated that disordered graphitic carbon was infiltrated in the PS pores, thus permeating completely the PS layer. Such a nanostructured carbon infiltration provided new properties to the PS material, which are potentially of great relevance for opto-electronics and sensors applications.
Pubblicato
Rilevanza internazionale
Articolo
Esperti anonimi
Settore CHIM/03 - Chimica Generale e Inorganica
Settore FIS/03 - Fisica della Materia
English
Chemical vapor deposition; Infiltration; nanostructured carbon; Porous silicon; Surface analysis; Chemical vapor infiltration(CVI)
https://onlinelibrary.wiley.com/doi/abs/10.1002/pssc.200674363
Mattei, G., Valentini, V., & Polini, R. (2007). Chemical vapour infiltration of nano-structured carbon in porous silicon. PHYSICA STATUS SOLIDI. C, CURRENT TOPICS IN SOLID STATE PHYSICS, 4(6), 2049-2053 [10.1002/pssc.200674363].
Mattei, G; Valentini, V; Polini, R
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/2108/34473
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