High concentrations of Ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) chromophores were linked covalently to two different kinds of SiO2 matrices prepared by the sol–gel method. The matrices differed in their reticulation level, determined by the organometallic precursor used during the synthesis. The materials were deposited as films by spin-coating. The chromophores in the films were oriented in a non-centrosymmetric way by a modified Corona poling set-up, and the nonresonant second order non-linear optical coefficient d 33(0) of the films was determined by means of the Maker fringe technique. It was found that there is an optimum concentration of chromophores for attaining the highest d 33(0) value in these materials. Their maximum d 33(0) value was found in the films with the least reticulated matrix, that value was equal to 5.2±0.5pm/V. Besides, the d 33(0) value was more stable in time in the less reticulated materials. High concentrations of Ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) chromophores were linked covalently to two different kinds of SiO2 matrices prepared by the sol–gel method. The matrices differed in their reticulation level, determined by the organometallic precursor used during the synthesis. The materials were deposited as films by spin-coating. The chromophores in the films were oriented in a non-centrosymmetric way by a modified Corona poling set-up, and the nonresonant second order non-linear optical coefficient d 33(0) of the films was determined by means of the Maker fringe technique. It was found that there is an optimum concentration of chromophores for attaining the highest d 33(0) value in these materials. Their maximum d 33(0) value was found in the films with the least reticulated matrix, that value was equal to 5.2±0.5pm/V. Besides, the d 33(0) value was more stable in time in the less reticulated materials.

Franco, A., Brusatin, G., Guglielmi, M., Stracci, G., DE MATTEIS, F., Casalboni, M., et al. (2010). Second harmonic generation in SiO2 sol-gel films functionalized with ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) molecules. JOURNAL OF NON-CRYSTALLINE SOLIDS, 356(33-34), 1689 [10.1016/j.jnoncrysol.2010.06.018].

Second harmonic generation in SiO2 sol-gel films functionalized with ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) molecules

DE MATTEIS, FABIO;CASALBONI, MAURO;
2010-01-01

Abstract

High concentrations of Ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) chromophores were linked covalently to two different kinds of SiO2 matrices prepared by the sol–gel method. The matrices differed in their reticulation level, determined by the organometallic precursor used during the synthesis. The materials were deposited as films by spin-coating. The chromophores in the films were oriented in a non-centrosymmetric way by a modified Corona poling set-up, and the nonresonant second order non-linear optical coefficient d 33(0) of the films was determined by means of the Maker fringe technique. It was found that there is an optimum concentration of chromophores for attaining the highest d 33(0) value in these materials. Their maximum d 33(0) value was found in the films with the least reticulated matrix, that value was equal to 5.2±0.5pm/V. Besides, the d 33(0) value was more stable in time in the less reticulated materials. High concentrations of Ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) chromophores were linked covalently to two different kinds of SiO2 matrices prepared by the sol–gel method. The matrices differed in their reticulation level, determined by the organometallic precursor used during the synthesis. The materials were deposited as films by spin-coating. The chromophores in the films were oriented in a non-centrosymmetric way by a modified Corona poling set-up, and the nonresonant second order non-linear optical coefficient d 33(0) of the films was determined by means of the Maker fringe technique. It was found that there is an optimum concentration of chromophores for attaining the highest d 33(0) value in these materials. Their maximum d 33(0) value was found in the films with the least reticulated matrix, that value was equal to 5.2±0.5pm/V. Besides, the d 33(0) value was more stable in time in the less reticulated materials.
2010
Pubblicato
Rilevanza internazionale
Articolo
Sì, ma tipo non specificato
Settore FIS/03 - FISICA DELLA MATERIA
English
Con Impact Factor ISI
Franco, A., Brusatin, G., Guglielmi, M., Stracci, G., DE MATTEIS, F., Casalboni, M., et al. (2010). Second harmonic generation in SiO2 sol-gel films functionalized with ethyl-[4-(4-nitro-phenylazo)-phenyl]-(2-oxiranylmethoxy-ethyl)-amine (ENPMA) molecules. JOURNAL OF NON-CRYSTALLINE SOLIDS, 356(33-34), 1689 [10.1016/j.jnoncrysol.2010.06.018].
Franco, A; Brusatin, G; Guglielmi, M; Stracci, G; DE MATTEIS, F; Casalboni, M; Detert, H; Grimm, B; Schrader, S
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/25029
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