Superconducting NbN nanonetworks with a very small number of interconnected nanowires, with diameter of the order of 4 nm, are fabricated combining a bottom-up (use of porous silicon nanotemplates) with a top-down technique (high-resolution electron beam lithography). The method is easy to control and allows the fabrication of devices, on a robust support, with electrical properties close to a one-dimensional superconductor that can be used fruitfully for novel applications.
Salvato, M., Baghdadi, R., Cirillo, C., Prischepa, S.l., Dolgiy, A.l., Bondarenko, V.p., et al. (2017). NbN superconducting nanonetwork fabricated using porous silicon templates and high-resolution electron beam lithography. NANOTECHNOLOGY, 28(46), 465301 [10.1088/1361-6528/aa8479].
NbN superconducting nanonetwork fabricated using porous silicon templates and high-resolution electron beam lithography
Salvato M.
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2017-01-01
Abstract
Superconducting NbN nanonetworks with a very small number of interconnected nanowires, with diameter of the order of 4 nm, are fabricated combining a bottom-up (use of porous silicon nanotemplates) with a top-down technique (high-resolution electron beam lithography). The method is easy to control and allows the fabrication of devices, on a robust support, with electrical properties close to a one-dimensional superconductor that can be used fruitfully for novel applications.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
