In mesostructured perovskite solar cell devices, charge recombination processes at the interface between the transparent conductive oxide, perovskite and hole transport layer are suppressed by depositing an efficient compact TiO2 blocking layer. In this contribution we investigate the role of the atomic layer deposited TiO2 on ITO-PET substrates in hybrid halide (CH3NH3PbI3-xClx) perovskite solar cells. In the absence of the TiO2 layer, very low open circuit voltage (V-OC = 35 my) and efficiency (eta = 0.02%) values are observed. The analysis of JV dark current reveals the lack of rectifying behaviour at the above mentioned interface. The introduction of ultra-thin ALD layers (from 2.5 to 44 nm) leads to an increment in all the photovoltaic parameters and, consequently, in the photovoltaic conversion efficiency. A maximum power conversion efficiency of 9.2% is achieved, much higher than the 4% obtained when a low temperature conventional sol gel TiO2 compact layer is used. The higher quality of the ALD layer in terms of low defect density and low level of impurities with respect to the solution processed approach has been highlighted by electrochemical characterization and XPS analysis. (C) 2017 Elsevier Ltd. All rights reserved.

Zardetto, V., Di Giacomo, F., Lucarelli, G., Kessels, W., Brown, T.m., Creatore, M. (2017). Plasma-assisted atomic layer deposition of TiO2compact layers for flexible mesostructured perovskite solar cells. SOLAR ENERGY, 150, 447-453 [10.1016/j.solener.2017.04.028].

Plasma-assisted atomic layer deposition of TiO2compact layers for flexible mesostructured perovskite solar cells

Zardetto V.;Di Giacomo F.;Lucarelli G.;Brown T. M.;
2017-01-01

Abstract

In mesostructured perovskite solar cell devices, charge recombination processes at the interface between the transparent conductive oxide, perovskite and hole transport layer are suppressed by depositing an efficient compact TiO2 blocking layer. In this contribution we investigate the role of the atomic layer deposited TiO2 on ITO-PET substrates in hybrid halide (CH3NH3PbI3-xClx) perovskite solar cells. In the absence of the TiO2 layer, very low open circuit voltage (V-OC = 35 my) and efficiency (eta = 0.02%) values are observed. The analysis of JV dark current reveals the lack of rectifying behaviour at the above mentioned interface. The introduction of ultra-thin ALD layers (from 2.5 to 44 nm) leads to an increment in all the photovoltaic parameters and, consequently, in the photovoltaic conversion efficiency. A maximum power conversion efficiency of 9.2% is achieved, much higher than the 4% obtained when a low temperature conventional sol gel TiO2 compact layer is used. The higher quality of the ALD layer in terms of low defect density and low level of impurities with respect to the solution processed approach has been highlighted by electrochemical characterization and XPS analysis. (C) 2017 Elsevier Ltd. All rights reserved.
2017
Pubblicato
Rilevanza internazionale
Articolo
Esperti anonimi
Settore ING-INF/01 - Elettronica
English
ALD; Thin films; Photovoltaics; Interface engineering; TiO2; Perovskites
https://www.sciencedirect.com/science/article/pii/S0038092X17303110
Zardetto, V., Di Giacomo, F., Lucarelli, G., Kessels, W., Brown, T.m., Creatore, M. (2017). Plasma-assisted atomic layer deposition of TiO2compact layers for flexible mesostructured perovskite solar cells. SOLAR ENERGY, 150, 447-453 [10.1016/j.solener.2017.04.028].
Zardetto, V; Di Giacomo, F; Lucarelli, G; Kessels, Wmm; Brown, Tm; Creatore, M
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/199781
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