Starting from their discovery in 1991, carbon nanotubes have attracted a great attention, thanks to their peculiar mechanical, electrical and elastic properties that could be used to realize new devices in many different fields. For nanotechnology applications it is very important to be able to control not only shape and position but also alignment and orientation of carbon nanotubes, both during the growth and after it. Here we present preliminary results obtained by depositing carbon nanotubes (CNT) solutions on ion sputtered quartz substrates. Atomic force microscopy (AFM) images allow to study both CNTs positioning on the ‘‘ripples’’ generated by Ar+ sputtering on the SiO2 surface and their radial deformation induced by the ‘‘rough’’ surface. Work is now in progress to optimize the sputtering parameters and solution treatment (purification and functionalization) in order to get single CNTs regularly arranged on a patterned surface. 2004 Elsevier B.V.
Granone, F., Mussi, V., Toma, A., Orlanducci, S., TERRANOVA PERSICHELLI, M.l., Boragno, C., et al. (2005). Ion sputtered surfaces as templates for C nanotubes alignment and deformation. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. SECTION B, BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 230, 545-550 [10.1016/j.nimb.2004.12.098].
Ion sputtered surfaces as templates for C nanotubes alignment and deformation
ORLANDUCCI, SILVIA;TERRANOVA PERSICHELLI, MARIA LETIZIA;
2005-01-01
Abstract
Starting from their discovery in 1991, carbon nanotubes have attracted a great attention, thanks to their peculiar mechanical, electrical and elastic properties that could be used to realize new devices in many different fields. For nanotechnology applications it is very important to be able to control not only shape and position but also alignment and orientation of carbon nanotubes, both during the growth and after it. Here we present preliminary results obtained by depositing carbon nanotubes (CNT) solutions on ion sputtered quartz substrates. Atomic force microscopy (AFM) images allow to study both CNTs positioning on the ‘‘ripples’’ generated by Ar+ sputtering on the SiO2 surface and their radial deformation induced by the ‘‘rough’’ surface. Work is now in progress to optimize the sputtering parameters and solution treatment (purification and functionalization) in order to get single CNTs regularly arranged on a patterned surface. 2004 Elsevier B.V.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
