The chemical origin of the C-H-O phase diagram of diamond plasma deposition methods has been presented. According to the suggested chemical reactions, in almost all C-H-O-gas-containing plasmas the principal reactions begin with carbon removal by oxygen to the very stable CO. The rest of the gases during diamond deposition can be regarded as basically the same with the first successful diamond plasma consisting of a Few per cent of hydrocarbons diluted in hydrogen gas. The suggested reactions result in successful diamond depositions only above the H-CO line in the C-H-O phase diagram.

Pinter, I., Tebano, A., Paoletti, A., Paroli, P. (1994). THE CHEMICAL BASIS OF THE C-H-O PHASE-DIAGRAM IN DIAMOND PLASMA DEPOSITIONS. DIAMOND AND RELATED MATERIALS, 3(2009/02/01 00:00:00.000), 126-128.

THE CHEMICAL BASIS OF THE C-H-O PHASE-DIAGRAM IN DIAMOND PLASMA DEPOSITIONS

TEBANO, ANTONELLO;
1994-01-01

Abstract

The chemical origin of the C-H-O phase diagram of diamond plasma deposition methods has been presented. According to the suggested chemical reactions, in almost all C-H-O-gas-containing plasmas the principal reactions begin with carbon removal by oxygen to the very stable CO. The rest of the gases during diamond deposition can be regarded as basically the same with the first successful diamond plasma consisting of a Few per cent of hydrocarbons diluted in hydrogen gas. The suggested reactions result in successful diamond depositions only above the H-CO line in the C-H-O phase diagram.
1994
Pubblicato
Rilevanza internazionale
Articolo
Sì, ma tipo non specificato
Settore FIS/03 - FISICA DELLA MATERIA
English
VAPOR-DEPOSITION
3
Pinter, I., Tebano, A., Paoletti, A., Paroli, P. (1994). THE CHEMICAL BASIS OF THE C-H-O PHASE-DIAGRAM IN DIAMOND PLASMA DEPOSITIONS. DIAMOND AND RELATED MATERIALS, 3(2009/02/01 00:00:00.000), 126-128.
Pinter, I; Tebano, A; Paoletti, A; Paroli, P
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/52403
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