Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown. © 2007 IEEE.

Lugli, P., Harrer, S., Strobel, S., Brunetti, F., Scarpa, G., Tornow, M., et al. (2007). Advances in nanoimprint lithography. In 7th IEEE International conference on nanotechnology - IEEE-NANO 2007 Proceedings (pp.1179-1184) [10.1109/NANO.2007.4601394].

Advances in nanoimprint lithography

BRUNETTI, FRANCESCA;
2007-01-01

Abstract

Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown. © 2007 IEEE.
7th IEEE International conference on nanotechnology - IEEE-NANO 2007
Hong Kong
2007
Rilevanza internazionale
su invito
2007
Settore ING-INF/01 - ELETTRONICA
English
Isothermal imprint; Nanofabrication; Nanoimprint lithography; Room-temperature nanoimprint lithography
Intervento a convegno
Lugli, P., Harrer, S., Strobel, S., Brunetti, F., Scarpa, G., Tornow, M., et al. (2007). Advances in nanoimprint lithography. In 7th IEEE International conference on nanotechnology - IEEE-NANO 2007 Proceedings (pp.1179-1184) [10.1109/NANO.2007.4601394].
Lugli, P; Harrer, S; Strobel, S; Brunetti, F; Scarpa, G; Tornow, M; Abstreiter, G
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/39403
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