The thermal stability of Ultra Dispersed Diamond on silicon surfaces has been investigated. Samples have been annealed under Ultra-High Vacuum conditions. The evolution of the carbon binding states at the surface has been monitored sequentially by XPS and XEELS. After annealing at 1173 K, sp(3) seeds present initially have been significantly modified. Contrary to lower temperature, no diamond has been detected either by XPS or by FEG-SEM after a short growth step. XPS spectra indicate the formation of silicon carbide.

Arnault, J., Saada, S., Williams, O., Haenen, K., Bergonzo, P., Nesladek, M., et al. (2008). Surface characterisation of silicon substrates seeded with diamond nanoparticles under UHV annealing. PHYSICA STATUS SOLIDI. A, APPLICATIONS AND MATERIALS SCIENCE, 205(9), 2108-2113 [10.1002/pssa.200879728].

Surface characterisation of silicon substrates seeded with diamond nanoparticles under UHV annealing

POLINI, RICCARDO;
2008-01-01

Abstract

The thermal stability of Ultra Dispersed Diamond on silicon surfaces has been investigated. Samples have been annealed under Ultra-High Vacuum conditions. The evolution of the carbon binding states at the surface has been monitored sequentially by XPS and XEELS. After annealing at 1173 K, sp(3) seeds present initially have been significantly modified. Contrary to lower temperature, no diamond has been detected either by XPS or by FEG-SEM after a short growth step. XPS spectra indicate the formation of silicon carbide.
2008
Pubblicato
Rilevanza internazionale
Articolo
Esperti anonimi
Settore CHIM/03 - CHIMICA GENERALE E INORGANICA
English
Con Impact Factor ISI
Diamonds; Silicon; Silicon carbide; Thermodynamic stability; X ray photoelectron spectroscopy; Binding states; Characterisation; Diamond nanoparticles; Feg-sem; Growth steps; High vacuums; Silicon substrates; Silicon surfaces; Thermal stabilities; UHV annealing; Annealing
https://onlinelibrary.wiley.com/doi/abs/10.1002/pssa.200879728
Arnault, J., Saada, S., Williams, O., Haenen, K., Bergonzo, P., Nesladek, M., et al. (2008). Surface characterisation of silicon substrates seeded with diamond nanoparticles under UHV annealing. PHYSICA STATUS SOLIDI. A, APPLICATIONS AND MATERIALS SCIENCE, 205(9), 2108-2113 [10.1002/pssa.200879728].
Arnault, J; Saada, S; Williams, O; Haenen, K; Bergonzo, P; Nesladek, M; Polini, R; Osawa, E
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2108/27690
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